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Written by Long VIC   
Monday, 16 January 2017 13:59

Facilities:

- Laboratories/equipments

  • Lechnology Lab (Sputtering, Evaporation, Rapid-quenching, Arc-melting).
  • High Magnetic Field Lab (> 10 T).
  • Chemical Lab.
  • Specimen Treatment Lab.
  • Vibrating Sample Magnetometer (VSM) DMS 800.
  • I-V and Magnetoresistance Characteristics System HP 4156 A.
  • Close Cycle Cryogenic System.
  • Dry Clean Compressed Gas, Nitro Gas and Nitro-Liquid System.

- Mechanical and electric workshops
- Computer Lab

Some pictures of equipment:

 

Magnetic pulse system  

Description: Measure magenitc properties of magnetic material under ultrahigh magentic field (30 Tesla)

Specifications:

  • Maximum magnetic field 30 Tesla at 77K and 26 Tesla at RT
  • Pulse duration: 3.9-32 ms
  • Error: 2%
  • Controlled by computer
  • Manufacturer: ITIMS, Vietnam
  • Year of manufacture: 1996, installation and use: 1997

Contact: Ass Prof. Dr.  Nguyen Phuc Duong

Keywords: Magnetic pulse system, Measure magenitc properties, ultrahigh magentic field 

 

Vibrating Sample Magnetometer

Description: Measure properties of magnetic material under average magnetic field (<1.3 Tesla) 

Specifications:

  • Maximum magnetic field: 1.4 Tesla
  • Sensitivity: 10-5 Emu
  • Temperature range: 77-1000K
  • Sample in volume or thin-film form
  • Controlled by computer
  • Manufacturer: ADE Technologies, USA
  • Year of manufacture: 1994
  • Code name: DMS 880

Contact: Ass Prof. Dr.  Nguyen Anh Tuan

KeywordsMagnetometer for vibrating sample,  thin-film form, DMS 880, ADE Technologies, VSM (Vibrating Sample Magnetometer);  Hysteresis loops; Thermal magnetic curves;

 

Sample annealing equipment using arc 

Description: Annealing and casting alloys

Specifications:

  • Control box: 380 VAC 50Hz
  • Arc source: ZX-500A
  • DC control: 100-400A
  • Sample furnaces: 7 furnaces with maximum 5g/furnace
  • Vacuum system: Mechanical pumping ZX2, pumping rate 8.8l/s
  • Diffusion pump JK2000, pumping rate 1500l/s
  • Manufacturer: Physics Insititute of Bejing, China
  • Year of manufacture: 2001 

Contact: Ass Prof. Dr.  Nguyen Phuc Duong

KeywordsSample annealing equipment using arc, Vacuum system, Diffusion pump JK2000, pumping rate

 

Evaporation system

Description: Grow mono and multilayer thin films

Specifications:

  • Highest vacuum level: 10-6Torr
  • One evaporated source using resistance
  • Film thickness measurement
  • Manufacturer: Balzer, Switzerland
  • Year of manufacture: 1980, installation and use: 1996
  • Code name: A 500

Contact: Ass Prof. Dr.  Nguyen Anh Tuan

KeywordsVacuum evaporated equipment, thin films, vacuum level, Film thickness measurement Evaporation system; thin films deposition by evaporating technique; vacuum system.

 

High frequency sputtering machine

Description: Grow mono and multilayer thin films

Specifications:

  • Highest vacuum level: 10-6Torr
  • 2 substrates, 1 sputtering source 400W
  • We have added 18 targets serving the investigation and growth mono, multilayer thin film or alloys
  • Manufacturer: Alcatel, France
  • Year of manufacture: 1980, installation and use 1996
  • Code name: SCM 400

 Contact: Ass Prof. Dr.  Nguyen Anh Tuan

Keywords: High frequency sputtering machine, thin films, multilayer thin film, SCM 400, Sputtering system; Thin films deposition by sputtering technique; vacuum system.

Last Updated ( Wednesday, 22 February 2017 10:22 )
 

Hanoi University of Science and Technology(HUST)

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