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Oxidation Furnace
Tuesday, 16 September 2008 15:32

Oxidation Furnace

 

Description:

Produce high quality Si oxide layers in dry oxygen environment

Specifications:

· Maximum temperature: 1200±5°C

· Gas environment: N2 , O2

· Controlled automatically in the temperature range: 40-1200°C

· Manufacturer: Netherland

· Code name: Tempress 261

Contact: Nguyen Van Toan

Key words: oxidation furnace, Delft University, Tempress 261, dry oxygen

 

 

 

 

 

Hanoi University of Science and Technology(HUST)

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