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Diffusion, oxidation furnace
Tuesday, 16 September 2008 15:31

Diffusion, oxidation furnace

Description:

· Diffusion of impurities at high temperature in semiconductors

· Oxidation at high temperature in both dry and humid oxygen environment

Specifications:

· Maximum temperature:  1200°C,±5°C

· Programmable and controllable the gas diffusion system

Manufacturer: Delft University, Netherlands

 

Contact: Nguyen Van Toan

Key words: Diffusion, oxidation furnace, Delft University

 

 

 

 

 

 

Hanoi University of Science and Technology(HUST)

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